Physical Vapor Deposition, PVD and sputtering technology is a true enabler for many of the products and applications encountered in daily life, in being able to produce functional thin films on most solid materials at low environmental impact.
The technology constantly finds new fields of applications and is growing with current applications to a predicted total CAGR of approx. 5% (2021-2030).
Hot Isostatic Pressing (HIP) is and can be used in the production of high-quality sputtering targets from most material systems:
- targets produced directly from a powder metal, ceramic, intermetal or compound
- improving properties of cast, sintered or sprayed targets
- target to backplate diffusion bonding
Hot Isostatic Pressing, HIP, and the unique process control as offered by the Quintus state of the art HIP/HPHT equipment, ensures high quality and productivity in both the target manufacturing and the thin film deposition.